PRIMARY COURSE TOPICS

You Will Learn How To

• Use Calibre nmBIAS for rule-based retargeting
• Use Calibre nmSRAF to insert sub-resolution assist features (SRAFs) into a design
• Use Calibre PIXbar to automatically generate SRAFs
• Modify SRAF generation using various options
• Find and correct SRAF conflicts with Mask Rule Constraints (MRCs)
• Create Calibre nmOPC setup files
• Specify various nmOPC options and simulation settings
• Control fragmentation options
• Manage OPC correction and convergence
• Write simple nmOPC TCL scripts
• Apply Calibre Process Window OPC (PWOPC) to meet the challenges of the real world lithography process
• Use Calibre SRAF Print Avoidance (SPA) to detect and prevent sub-resolution assist features (SRAFs) from printing
• Integrate OPCverify into the post-tape-out flow
• Write and execute simple OPCverify rule decks
• Generate a basic OPCverify setup file for layer verification
• Perform process window verification in both production and recipe development flows
• Use limiting code in OPCverify to reduce error output
• Analyze OPCverify tabular property data with the Calibre RVE GUI