This course will help you understand the impact of multi-patterning on your designs and how to use Calibre to find and fix layout problems associated with this approach.
Starting with the 22nm processing node, the use of multiple masks to print a single layer becomes a requirement because of lithography issues. Foundries have already modified their rule decks to support the use of multi-patterning and will require all 22nm (and smaller) customers to use this technique. There are many implications for chip designers and CAD support teams when multi-patterning is employed. This course will help users understand those implications and show them how to create designs that are compatible with multi-patterning using foundry-provided rule decks and Calibre.
Throughout this course, extensive hands-on lab exercises provide you with practical experience using Calibre multi-patterning software. Hands-on lab topics include: