Calibre Multi-Patterning

Course Code
Calibre 2016.4
User Level
List Price
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LIVE Online Duration
6 hours for each day for 4 days

Course Overview

This course will help you understand the impact of multi-patterning on your designs and how to use Calibre to find and fix layout problems associated with this approach.

Course Details

Starting with the 22nm processing node, the use of multiple masks to print a single layer becomes a requirement because of lithography issues. Foundries have already modified their rule decks to support the use of multi-patterning and will require all 22nm (and smaller) customers to use this technique. There are many implications for chip designers and CAD support teams when multi-patterning is employed. This course will help users understand those implications and show them how to create designs that are compatible with multi-patterning using foundry-provided rule decks and Calibre.



  • Completion of the Calibre nmDRC/nmLVS class or equivalent experience with Calibre nmDRC is required
  • Completion of the Calibre DRC/LVS rule-writing course is recommended but not required
  • Thorough knowledge of IC layout techniques and procedures
  • Experience with an IC layout editing tool
  • Familiarity with UNIX
  • Good understanding of layout verification concepts and experience with layout verification tools

Class Package
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Learning Services, EDA India


What You’ll Learn

  • Why multi-patterning is needed
  • Various techniques employed to compensate for multi-patterning implications
  • How to invoke Calibre to identify and potentially repair multi-patterning layout problems
  • How to interpret Calibre output to locate and understand problematic layout geometries
  • How to modify layouts to reduce or eliminate multi-patterning problems
  • Basic Calibre SVRF coding techniques used to find and fix multi-patterning layout issues

Throughout this course, extensive hands-on lab exercises provide you with practical experience using Calibre multi-patterning software. Hands-on lab topics include:

  • Viewing “bad” mask contours
  • Running a Calibre double patterning example
  • DRC spacing rule implications
  • Running the new Calibre DP flow
  • Exercising different decomposition flows
  • User-defined color choices
  • Dealing with hierarchy
  • Recommended flows
  • Interpreting DP results in RVE
  • Using DP with LVS