Calibre
Calibre Pattern Matching
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Course Abstract
The Calibre Pattern Matching course will provide all of the information you need to create and use layout patterns. This course will show you how to use patterns to streamline DRC and minimize RET hot spots.
Course Details
This course will take you through the steps used to capture layout patterns that can be used in subsequent applications such as DRC and Litho-Friendly Design. You will learn how to use both the Pattern Library Manager GUI and SVRF code for pattern capture and pattern comparison. You will learn how to enhance the pattern matching process through the specification of pattern constraints and allowed pattern variations. Hands-on lab exercises will reinforce lecture and discussion topics under the guidance of our industry expert instructors.
Prerequisites
- Familiarity with concepts of IC layout.
- Experience writing Calibre DRC rules or completion of the Calibre Fundamentals: Writing DRC/LVS Rules training class.
PRIMARY COURSE TOPICS
What You’ll Learn
- Using patterns to simplify layout analysis functions
- Capturing patterns using the Pattern Library Manager GUI
- Capturing patterns using SVRF statements
- Matching patterns using the Pattern Library Manager GUI
- Matching patterns using SVRF statements
- Specification of pattern matching output choices
- Specification of pattern variations allowed during matching
- Working with pattern properties
- Compressing pattern libraries using pattern grouping
- Using the pattern matching API to customize jobs